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Publication
Mechanisms of TiN Effective Workfunction Tuning at Interfaces with HfO2 and SiO2
Journal Contribution - Journal Article
Journal: Journal of Physical Chemistry C
ISSN: 1932-7447
Issue: 28
Volume: 124
Pages: 15547 - 15557
Publication year:2020
BOF-keylabel:yes
IOF-keylabel:yes
BOF-publication weight:2
CSS-citation score:1
Authors:International
Authors from:Government, Higher Education
Accessibility:Open