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Publication

Atomic layer deposition of localized boron- and hydrogen-doped aluminum oxide using trimethyl borate as a dopant precursor

Journal Contribution - Journal Article

Journal: CHEMISTRY OF MATERIALS

ISSN: 1520-5002

Issue: 10

Volume: 32

Pages: 4152 - 4165

Publication year:2020

Handle: http://hdl.handle.net/1854/LU-8690481
WoS Id: 000537657500004
DOI: https://doi.org/10.1021/acs.chemmater.9b04967

Accessibility:Closed