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Project

Adapt & use ultrafast spectrometry to unravel reaction dynamics in lithographic materials exposed to high harmonic generated extreme ultraviolet radiation

EUV exposure of resists spans a complex reaction spectrum from 92 to 0.02 eV; this project seeks to study the radiolysis of high energy electrons and the subsequent chemistry of low energy electrons using ultrafast EUV, IR, Xray, and electron spectroscopies. Extreme ultraviolet (EUV) lithography is essential for the fabrication of advanced semiconductor devices. This project explores the capabilities of interference lithography using EUV high harmonic sources to produce features smaller than 10 nanometres.

Date:1 May 2021 →  31 Mar 2022
Keywords:EUV Lithography
Disciplines:Quantum chemistry, Radiation and matter
Project type:PhD project