< Back to previous pagePublication Processing Stability of Monolayer WS2 on SiO2 Journal Contribution - Journal ArticleJournal: Nano ExpressIssue: 2Volume: 2Publication year:2021WoS Id: 000659104800001DOI: https://doi.org/10.1088/2632-959x/ac022bInstitutional Repository URL: https://lirias.kuleuven.be/3472046 Accessibility:OpenAuthors/publisherGilles Delie (First author)D Chiappe (Author)I Asselberghs (Author)C Huyghebaert (Author)I Radu (Author)S Banerjee (Author)B Groven (Author)S Brems (Author)VV Afanas'ev (Last author)Research unitsSemiconductor Physics(Division)KU Leuven