Chemical Vapor Deposition of Ionic Liquids for the Fabrication of Ionogel Films and Patterns

Film deposition and high-resolution patterning of ionic liquids (ILs) remain a challenge, despite a broad range of applications that would benefit from this type of processing. Here, we demonstrate for the first time the chemical vapor deposition (CVD) of ILs. The IL-CVD method is based on the formation of a non-volatile IL through the reaction of two vaporized precursors. Ionogel micropatterns can be easily obtained via the combination of IL-CVD and standard photolithography, and the resulting microdrop arrays can be used as microreactors. The IL-CVD approach will facilitate leveraging the properties of ILs in a range of applications and microfabricated devices.

Publication year:2021

BOF-keylabel:yes

IOF-keylabel:yes

BOF-publication weight:6

CSS-citation score:1

Authors from:Higher Education

Accessibility:Open