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Project
Fundamental study of the growth kinetics and conformality of thermal and plasma-enhanced atomic layer deposition
Growth kinetics of ALD and PE-ALD: this work studies fundamental questions about initial nucleation, the evolution of the surface roughness and crystallinity of the films during deposition. Conformality of ALD and PE-ALD: this study aims to characterize the conformality as a function of aspect ratio, temperature and pulse times. A second goal is to model the conformality.
Date:1 Oct 2008 → 30 Sep 2012
Keywords:plasma-enhanced atomic layer deposition, Atomic Layer Deposition (ALD), growth kinetics, conformality, kinetic model
Disciplines:Condensed matter physics and nanophysics