In-situ x-ray based study of the nucleation and growth of metals during atomic layer deposition (ALD)

A fundamental understanding of the surface chemistry and of key effects that control the initial nucleation and subsequent evolution of film morphology during metal-ALD will be achieved. As prototype systems, the focus will lie on three ALD chemistries for Ru and Ag. The experimental approach utilizes x-ray based surface-sensitive characterization techniques that can be applied in situ or without vacuum break.