Method for activating a porous layer surface

A method for activating an exposed surface (1) of a porous dielectric layer (2), the method comprising the steps of: I. Filling with a first liquid (5) at least the pores (4) present in a part (10) of the porous dielectric layer (2), said part (10) comprising the exposed surface (1), II. Removing the first liquid (5) selectively from the surface (1), III. Activating the exposed surface (1), and IV. Removing the first liquid (5) from the bulk part (3) of the porous dielectric layer (2).

Patent Publication Number: EP2884523

Year filing: 2020

Year approval: 2020

Year publication: 2020

Status: Assigned

Technology domains: Semiconductors

Validated for IOF-key: Yes

Attributed to: Associatie KULeuven