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Patent

Method for activating a porous layer surface

A method for activating an exposed surface (1) of a porous dielectric layer (2), the method comprising the steps of: I. Filling with a first liquid (5) at least the pores (4) present in a part (10) of the porous dielectric layer (2), said part (10) comprising the exposed surface (1), II. Removing the first liquid (5) selectively from the surface (1), III. Activating the exposed surface (1), and IV. Removing the first liquid (5) from the bulk part (3) of the porous dielectric layer (2).
Patent Publication Number: EP2884523
Source: EPO
Year filing: 2013
Year approval: 2016
Year publication: 2020
Status: Assigned
Technology domains: Semiconductors
Validated for IOF-key: Yes
Attributed to: Associatie KULeuven