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Patent

Method for dissolving chalcogen elements and metal chalcogenides in non-hazardous solvents

The present disclosure provides a method of preparing a chalcogen containing solution that is hydrazine free and hydrazinium free, wherein the method comprises: providing a predetermined amount of elemental chalcogen; providing a predetermined amount of elemental sulfur; providing an amine solvent; and combining the predetermined amount of elemental chalcogen and the predetermined amount of elemental sulfur in the amine solvent, thereby dissolving the elemental chalcogen and the elemental sulfur in the amine solvent. The chalcogen containing solution can advantageously be used as a precursor for the formation of a chalcogen containing layer on a substrate.
Patent Publication Number: US9842733
Source: USPTO
Year approval: 2017
Year publication: 2017
Status: Assigned
Technology domains: Semiconductors, Materials, metallurgy
Validated for IOF-key: Yes