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Project

A fundamental study of nucleation and growth during thermal and plasma-enhanced atomic layer deposition of noble metals using in situ synchtron-based characterization techniques.

This project aims at an improved understanding of atomic layer deposition (ALD) of noble metals. In situ x-ray fluorescence and scattering techniques will be used to obtain insights in the formation of nanoparticles during the initial growth phase. The coarsening behavior of the nanoparticles at elevated temperatures and the effect of stabilizingultrathin ALD coatings will be studied as well.

Date:1 Oct 2013 →  1 Mar 2020
Keywords:X-ray flueorescence, ALD, GISAXS, growth kinetics, nucleation, atomic layer deposition
Disciplines:Materials science and engineering, Ceramic and glass materials, Macromolecular and materials chemistry, Semiconductor materials, Condensed matter physics and nanophysics, Analytical chemistry, Other materials engineering