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Project
Study of plasma-surface interactions, by molecular dynamics simulations, for applications of plasma-etching and plasma-deposition. (FWO Vis.Fel., Fujun GOU, China)
In this project plasma-surface interactions will be studied by molecular dynamics simulations, for applications of plasma-etching (of Si/SiO2 surfaces in the micro-electronics industry) and for plasma-deposition of thin films.
Date:1 Feb 2009 → 31 Jan 2010
Keywords:THEORETICAL STUDY, MOLECULAR DYNAMICS, PLASMA DEPOSITION, COMPUTER SIMULATIONS, THIN FILMS, SILICON, PLASMA, SURFACE MODIFICATIONS
Disciplines:Applied mathematics in specific fields, Classical physics, Physics of gases, plasmas and electric discharges, Physical chemistry, Materials science and engineering
Project type:Collaboration project