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Project

Topographic fidelity in optical surface metrology

In this project research into the topographic fidelity in optical surface measurement will be carried out. For this, several known and probably new techniques will be investigated and methods to improve the topographic fidelity will be researched and applied. This will be carried out on instrumentation already present, but also new instruments may be designed, or add-on's to already present instrumentation may be designed. The physical-mathematical modeling of the measurement process is essential in this research, as well as the processing of large quantities of measurement data and the application of advanced algorithms,
Date:1 Oct 2018 →  30 Sep 2020
Keywords:metrology
Disciplines:Other engineering and technology, Ceramic and glass materials, Materials science and engineering, Semiconductor materials, Other materials engineering