< Back to previous pagePublication Feasibility study of grapho-epitaxy DSA for complementing EUV lithography beyond N10 Book Contribution - Book Chapter Conference ContributionBook: Proc. DSA2015Publication year:2015Institutional Repository URL: https://lirias.kuleuven.be/1733079ArticleNumber: O10 Accessibility:ClosedAuthors/publisherChenxi Lin (First author)Yi Zou (Author)Davide Ambesi (Author)Tamara Druzhinina (Author)Sander Wuister (Author)Ioannis Karageorgos (Author)Julien Ryckaert (Author)Praveen Raghavan (Author)Roel Gronheid (Last author)Research unitsElectronic Circuits and Systems (ECS)(Division)KU LeuvenEventsInternational Symposium on DSA()Leuven, Belgium
