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Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films

Journal Contribution - Journal Article

Robust and scalable thin-film deposition
methods are key to realize the potential of metal-organic
frameworks (MOFs) in electronic devices. Here, we report
the first integration of the chemical vapor deposition (CVD)
of MOF coatings in a custom reactor within a cleanroom
setting. As a test case, the MOF-CVD conditions for
the zeolitic imidazolate framework-8 are optimized to enable
smooth, pinhole-free, and uniform thin films on full 200 mm
wafers under mild conditions. The single-chamber MOF-CVD
process and the impact of the deposition parameters are
elucidated via a combination of in situ monitoring and ex situ
characterization. The resulting process guidelines will pave the
way for new MOF-CVD formulations and a plethora of MOF based devices.
Journal: Chemistry of Materials
ISSN: 0897-4756
Issue: 22
Volume: 31
Pages: 9462-9471
Number of pages: 10
Publication year:2019