Researcher
Matthias Minjauw
- Keywords:ultra-high vacuum, atomic layer deposition, x-ray photoelectron spectroscopy
- Disciplines:Functionalisation of materials, Nanomaterials, Metals and alloy materials, Surface and interface chemistry, Surface engineering, Nanophysics and nanosystems, Metrology, Materials synthesis, Surfaces, interfaces, 2D materials
Affiliations
- Department of Solid State Sciences (Department)
Member
From6 Aug 2013 → Today
Projects
1 - 2 of 2
- An in situ investigation of the surface chemistry during the nucleation and growth of cobalt and nickel using atomic layer depositionFrom1 Oct 2019 → 30 Sep 2022Funding: FWO junior postdoctoral fellowship
- In-situ x-ray based study of the nucleation and growth of metals during atomic layer deposition (ALD)From1 Oct 2014 → 30 Sep 2018Funding: BOF - Other initiatives, FWO fellowships
Publications
21 - 30 of 66
- Plasmonic gold-embedded TiO2 thin films as photocatalytic self-cleaning coatings(2020)
Authors: Hannelore Peeters, Maarten Keulemans, Gert Nuyts, Frederik Vanmeert, Chen Li, Matthias Minjauw, Christophe Detavernier, Sara Bals, Silvia Lenaerts, Sammy W. Verbruggen
- Reaction mechanism of the Me3AuPMe3-H-2 plasma-enhanced ALD process(2020)
Authors: Michiel Van Daele, Matthew B. E. Griffiths, Matthias Minjauw, Sean T. Barry, Christophe Detavernier, Jolien Dendooven
Pages: 11903 - 11914 - The co-reactant role during plasma enhanced atomic layer deposition of palladium(2020)
Authors: Ji-Yu Feng, Matthias Minjauw, Ranjith Karuparambil Ramachandran, Michiel Van Daele, Hilde Poelman, Timo Sajavaara, Jolien Dendooven, Christophe Detavernier
Pages: 9124 - 9136 - In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating(2020)
Authors: Eduardo Solano Minuesa, Jolien Dendooven, Ji-Yu Feng, Philipp Bruener, Matthias Minjauw, Ranjith Karuparambil Ramachandran, Michiel Van Daele, Kevin Van de Kerckhove, Thomas Dobbelaere, Alessandro Coati, et al.
Pages: 11684 - 11693 - Atomic Layer Deposition of Ru-containing materials using RuO4 as both the co-reactant and the metal source(2020)
Authors: Matthias Minjauw, Ji-Yu Feng, Jolien Dendooven, Christophe Detavernier
Number of pages: 1 - Reaction pathways for atomic layer deposition with lithium hexamethyl disilazide, trimethyl phosphate, and oxygen plasma(2020)
Authors: Andreas Werbrouck, Felix Mattelaer, Matthias Minjauw, Mikko Nisula, Jaakko Julin, Frans Munnik, Jolien Dendooven, Christophe Detavernier
Pages: 27829 - 27839 - Atomic layer deposition of localized boron- and hydrogen-doped aluminum oxide using trimethyl borate as a dopant precursor(2020)
Authors: Felix Mattelaer, Michiel Van Daele, Matthias Minjauw, Mikko Nisula, Simon D. Elliott, Timo Sajavaara, Jolien Dendooven, Christophe Detavernier
Pages: 4152 - 4165 - Atomic layer deposition of nitrogen-doped Al phosphate coatings for Li-ion battery applications(2020)
Authors: Lowie Henderick, Hamid Hamed, Felix Mattelaer, Matthias Minjauw, Johan Meersschaut, Jolien Dendooven, Mohammadhosein Safari, Philippe Vereecken, Christophe Detavernier
Pages: 25949 - 25960 - Area-selective growth and nucleation enhancement during Ru ALD using the RuO4 precursor and H2-gas(2020)
Authors: Matthias Minjauw, Hannes Rijckaert, Christophe Detavernier, Jolien Dendooven
Number of pages: 1 - Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy(2020)
Authors: Sofie Vandenbroucke, Elisabeth Levrau, Matthias Minjauw, Michiel Van Daele, Eduardo Solano Minuesa, Rita Vos, Jolien Dendooven, Christophe Detavernier
Number of pages: 1