Publications
Controlled BZO nanorod growth and improved flux pinning in YBCO films grown on vicinal STO substrates Ghent University
The present study systematically investigates the impact of strain-induced defects on the anisotropy of the critical current density across wide temperature and magnetic field ranges. We focus on 0-10 wt % BaZrO3 (BZO)-doped YBa2Cu3O7- x (YBCO) thin films that are deposited on SrTiO3 substrates with a 5 degrees surface miscut. Our findings highlight the crucial role played by these vicinal substrates in governing the growth of BZO nanorods ...
Textured growth of oxide materials via chemical solution deposition : a case study for electro-optical thin films Ghent University
Textured Growth of Oxide Materials via Chemical Solution Deposition – A Case Study for Electro-Optical Thin Films Klaartje De Buysser, Ewout Picavet, Hannes Rijckaert, Laura Van Bossele, Arend Mandelings, Isabel Van Driessche, Dries Van Thourhout, Jeroen Beeckman Shifting for randomly oriented polycrystalline films towards highly oriented thin films has been a subject of many studies. Often this goes hand in hand with vacuum techniques or ...
Complex electrostatic effects on the selectivity of membrane-permeabilizing cyclic lipopeptides Ghent University
Cyclic lipopeptides (CLiPs) have many biological functions, including the selective permeabilization of target membranes, and technical and medical applications. We studied the anionic CLiP viscosin from Pseudomonas along with a neutral analog, pseudodesmin A, and the cationic viscosin-E2K to better understand electrostatic effects on target selectivity. Calcein leakage from liposomes of anionic phosphatidylglycerol (PG) and ...
Charting the lipopeptidome of nonpathogenic Pseudomonas Ghent University KU Leuven
Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layers Ghent University
Area selective atomic layer deposition (AS-ALD) is an interesting bottom-up approach due to its self-aligned fabrication potential. Ruthenium dioxide (RuO2) is an important material for several applications, including microelectronics, demanding area selective processing. Herein, it is shown that ALD of RuO2 using methanol and RuO4 as reactants results in uninhibited continuous growth on SiO2, whereas there is no deposition on polymethyl ...