Design, Fabrication and Characterization of Tunnel Field Effect Transistors for Ultra-Low Power CMOS Applications (Ontwerp, fabricatie en karakterisatie van tunnel veld effect transistoren voor ultra-laag vermogen CMOS toepassingen) KU Leuven
Silicon CMOS has emerged over the last 25 years as the predominant technology of the microelectronics industry. The concept of device scaling has been consistently applied over many technology generations, resulting in consistent improvement in both device density and performance. In the last decade, the shrinking of the transistor dimensions led to short channel effects (SCEs) which decreases the device performance. As a consequence, additional ...