A method of performing metrology on a microfabrication pattern. Interuniversity Microelectronics Centre
There is provided a method of performing metrology on a microfabrication pattern, the method comprising: generating, by a SEM, a first set of frames of a first region of the pattern, a second set of frames of a second region of the pattern, and a third set of frames of a third region of the pattern, wherein a number of frames of the first, second and third sets of frames are different; for each of the first, second and third set of frames, by a computing device: estimating feature data representing edge positions, linewidths or centerline positions of one or more features of the region of the ...