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Onderzoeker
Jan Doise
- Disciplines:Modellering, Multimediaverwerking, Sensoren, biosensoren en slimme sensoren, Andere elektrotechniek en elektronica, Andere ingenieurswetenschappen en technologie
Affiliaties
- Departement Elektrotechniek (ESAT) (Departement)
Lid
Vanaf1 okt 2013 → 21 jan 2018
Projecten
1 - 1 of 1
- Implementatie van gestuurde zelf-assemblage gebaseerd op blokcopolymeren voor geavanceerde lithografie.Vanaf3 sep 2013 → 31 dec 2018Financiering: BOF - Nieuwe Onderzoeksinitiatieven, IWT persoonsgebonden financ. - strategische onderzoeksbeurzen
Publicaties
1 - 10 van 24
- Influence of Homopolymer Addition in Templated Assembly of Cylindrical Block Copolymers(2019)
Auteurs: Jan Doise
Pagina's: 4073 - 4082 - Studying the effects of chemistry and geometry on DSA hole-shrink process in three-dimensions(2018)
Auteurs: Chun Zhou, Tsuyoshi Kurosawab, Takahiro Dazai, Jan Doise, Jiaxing Ren, Cody Bezik, Tamar Segal-Peretz, Roel Gronheid, Pauline Rincon-Delgadillo, Akiyoshi Yamazaki, et al.
- Dual brush process for selective surface modification in graphoepitaxy directed self-assembly(2017)
Auteurs: Jan Doise
Pagina's: 33503 - Dual brush process for selective surface modification in graphoepitaxy directed self-assembly(2017)
Auteurs: Jan Doise
Pagina's: 101460 - Via patterning in the 7-nm node using immersion lithography and graphoepitaxy directed self-assembly(2017)
Auteurs: Jan Doise
Pagina's: 023506 - 023506 - High-chi, Si-Containing Block Copolymers and Process Strategies for Directing Their Self-Assembly(2017)
Auteurs: Christopher J Ellison, C Grant Willson, Dustin Janes, Gregory Blachut, Yasunobu Soymeya, Paulina A Rincon Delgadillo, Geert Vandenberghe, Arjun Singh, Jan Doise, Natsuko Ito, et al.
Pagina's: 187 - 190 - Templated DSA vias in sub-7 nm circuits: Design strategy and DSA-aware via decomposition(2016)
Auteurs: Carolien Boeckx, Jan Doise, Ioannis Karageorgos, Stefan De Gendt
Pagina's: 1 - 1 - Influence of template fill in grapho-epitaxy DSA(2016)
Auteurs: Jan Doise
Pagina's: 1 - 9 - EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes(2016)
Auteurs: Carolien Boeckx, Jan Doise, Ioannis Karageorgos
Pagina's: 97761 - Photo-responsive oligo(dimethylsiloxane) liquid crystals for defect-free nano-patterning at the sub-5 nm scale(2016)
Auteurs: Jan Doise
Pagina's: 10068 - 10072
Patenten
1 - 6 van 6
- Method for forming a cross-linked layer (Inventor)
- Directed self-assembly of block copolymers (Inventor)
- Method for manufacturing a mask (Inventor)
- Method for forming a cross-linked layer (Inventor)
- Method for manufacturing a mask (Inventor)
- Method for patterning a substrate involving directed self-assembly (Inventor)