< Terug naar vorige pagina
Onderzoeker
Koen Strijckmans
- Trefwoorden:reactief magnetron sputteren, computationele modellering
- Disciplines:Fysica van de gecondenseerde materie en nanofysica niet elders geclassificeerd
Affiliaties
- Vakgroep Vastestofwetenschappen (Departement)
Lid
Vanaf1 sep 2009 → Heden
Publicaties
1 - 10 van 28
- Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering(2023)
Auteurs: Josja Van Bever, Koen Strijckmans, Diederik Depla
- Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures(2021)
Auteurs: Diederik Depla, Robin Dedoncker, Koen Strijckmans
- Sputter yield measurements to evaluate the target state during reactive magnetron sputtering(2020)
Auteurs: Roeland Schelfhout, Koen Strijckmans, Diederik Depla
- Modeling reactive magnetron sputtering : opportunities and challenges(2019)
Auteurs: Diederik Depla, Koen Strijckmans, Dulmaa Altangerel, Florian Cougnon, Robin Dedoncker, Roeland Schelfhout, Isabella Schramm, Filip Moens, Roger De Gryse
- Tutorial: Hysteresis during the reactive magnetron sputtering process(2018)
Auteurs: Koen Strijckmans, Roeland Schelfhout, Diederik Depla
- Anomalous effects in the aluminum oxide sputtering yield(2018)
Auteurs: Roeland Schelfhout, Koen Strijckmans, Diederik Depla
- An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering(2018)
Auteurs: Roeland Schelfhout, Koen Strijckmans
Pagina's: 231 - 236 - The existence of a double S-shaped process curve during reactive magnetron sputtering(2016)
Auteurs: Roeland Schelfhout, Koen Strijckmans
- Hysteresis behavior during facing target magnetron sputtering(2016)
Auteurs: Florian Cougnon, Koen Strijckmans, Roeland Schelfhout
Pagina's: 215 - 219 - On the target surface cleanness during magnetron sputtering(2015)
Auteurs: Roeland Schelfhout, Koen Strijckmans, Francis Boydens
Pagina's: 743 - 747