An euvl scanner

The present invention relates to an EUVL scanner (10). The EUVL scanner comprises: an EUV light source (110); a reticle (120); a pellicle (130) mounted in front of the reticle (120) and comprising an EUV transmissive membrane (132) which, in use, scatters transmitted light into an elliptical scattering pattern (112) having a major axis (114); and an anamorphic high-NA imaging system (140) configured to project, onto a target wafer (150), light reflected by the reticle (120) through the pellicle (130); wherein a cross section (162) of an acceptance cone (160) of the imaging system (140) has a major axis (164), and wherein the pellicle (130) is arranged relative to the imaging system (140) such that the major axis (114) of the scattering pattern (112) is oriented at an angle relative to the major axis (164) of the cross section (162) of the acceptance cone (160) of the imaging system (140).

Octrooi-publicatienummer: EP3674797

Jaar aanvraag: 2021

Jaar toekenning: 2021

Jaar van publicatie: 2021

Status: Toegewezen

Technologiedomeinen: Optica, Materialen, metallurgie

Gevalideerd voor IOF-sleutel: Ja

Toegewezen aan: Associatie KULeuven