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Project

Studie van MgO dunne filmen en heterostructuren voor CMOS toepassingen

To continuously increase logic device performance, there is a strong interest to replace all the materials of the Si CMOS as well as to developnew device concepts. In this PhD project, alternative materials for thekey CMOS components will be investigated. This includes materials for the semiconducting channel, the gate oxide as well as the contacts. The main semiconductors of interest are novel Ge alloys as well as III/V compounds. Novel passivation schemes and oxide compounds never tested beforein this context will be explored in this project. For the metal contacts, Ge and Ga alloys will be investigated. To find the best parameters from a device perspective, device modeling will be performed taking into account the obtained experimental results for the channel materials, the gate oxide properties and the metallic contacts.
Datum:1 okt 2010 →  19 mei 2015
Trefwoorden:CMOS applications
Disciplines:Fysica van gecondenseerde materie en nanofysica
Project type:PhD project