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CVD diamond growth from nanodiamond seeds buried under a thin chromium layer
Tijdschriftbijdrage - Tijdschriftartikel
This work presents a morphological and structural analysis of CVD diamond growth on silicon from nanodiamond seeds covered by a 50 nm thick chromium layer. The role of carbon diffusion as well as chromium and carbon silicide formation is analyzed. The local diamond environment is investigated by scanning transmission electron microscopy in combination with electron energy-loss spectroscopy. The evolution of the diamond phase composition (sp(3)/sp(2)) is evaluated by micro-Raman spectroscopy. Raman and X-ray diffraction analysis are used to identify the interfacial phases formed during CVD growth. Based upon the observed morphological and structural evolution, a diamond growth model from nanodiamond seeds buried beneath a thin Cr layer is proposed. (C) 2016 Elsevier B.V. All rights reserved.
Tijdschrift: Diamond and Related Materials
Pagina's: 163 - 168
Trefwoorden:CVD diamond, Cr diffusion, Cr carburization, Si-Cr interface
Authors from:Government, Higher Education, Private