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Atomic layer deposition of palladium and bimetallic materials

Boek - Dissertatie

The PhD thesis entitled U+201CAtomic Layer Deposition of Palladium and Bimetallic MaterialsU+201D was accomplished by Ji-Yu Feng, the PhD student from CoCooN research group, Department of Solid State Sciences of Ghent University. The research was started in September 2016 and results up to June 2020. The experiment work was implemented mainly at the Department of Solid States Sciences.Atomic Layer Deposition (ALD) is a material growth technique that enables the deposition of thin films in an atomic layer-by-layer (sub-nanometers) fashion, which attracts intensive interest in various nanotechnology applications. In this thesis, Plasma-Enhanced Atomic Layer Deposition (PE-ALD) of Palladium (Pd) is investigated, focusing on the mechanism that governs the steady growth and nucleation phenomenon. For steady growth research, this work investigates the role of different plasma and plasma sequence as co-reactant during Pd ALD. For nucleation study, tuning strategies for controlling the size and coverage of Pd nanoparticles were developed. Moreover, a novel concept of ALD using RuO4 as co-reactant is demonstrated by developing several new processes for ternary metal (Al and Pt) ruthenates and bimetal nanomaterials (Ru-Pt and Ru-Pd). The PhD research results in four original papers, which have been or will be published in peer-review journals.
Pagina's: xxvi, 227 p.
Jaar van publicatie:2020