Development of ALD HfZrOx with TDEAH, TDEAZ and H2O KU Leuven
A 300mm ALD HfZrO x process using TDEAH, TDEAZ, and H 2 O is developed. This process applies a nano-laminate approach to grow a HfZrO x film by intermixing ALD HfO 2 and ZrO 2 around 250°C. It is found that the corresponding Zr content of the film, measured by RBS, increases linearly with the cycle ratio of Zr/(Zr+Hf). In addition, the initial growth behavior of the HfZrO x film of this unique process is insensitive to the starting surface ...