Method and apparatus for preventing galvanic corrosion in semiconductor processing KU Leuven
The present invention is related to a method and apparatus for cleaning a semiconductor substrate (1,13) comprising on a surface of the substrate at least one structure (5) comprising a first conducting or semiconducting material, surrounded by a layer (4) of a second conducting or semiconducting material, said layer essentially extending over the totality of said surface, said first and second material being in physical contact, the method comprising the steps of: - Providing said substrate (1), - Positioning a counterelectrode (20,30) facing said substrate surface, - supplying an ...