Publicaties
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The self out-of-plane oriented La2O2CO3 film : an integration tool for fiber textured ferroelectric thin films Universiteit Gent
A crucial role in the miniaturization of electronic and photonic components is played by the integration of ferroelectric thin films on silicon (Si) or silicon nitride (SiN) based platforms. Since the properties of ferroelectric thin films strongly depend on their texture quality and crystallographic orientation, the integration of thin films on these platforms is far from trivial. Consequently, this leads to slow, complex and expensive ...
Texture-dependent twin formation in nanocrystalline thin Pd films Universiteit Antwerpen
Nanocrystalline Pd films were produced by electron-beam evaporation and sputter deposition. The electron-beam-evaporated films reveal randomly oriented nanograins with a relatively high density of growth twins, unexpected in view of the high stacking fault energy of Pd. In contrast, sputter-deposited films show a clear 〈1 1 1〉 crystallographic textured nanostructure without twins. These results provide insightful information to guide the ...
The effect of microstructure and film composition on the mechanical properties of linear antenna CVD diamond thin films Interuniversitair Micro-Electronica Centrum vzw Universiteit Antwerpen Universiteit Hasselt
This study reports the impact of film microstructure and composition on the Young's modulus and residual stress in nanocrystalline diamond (NCD) thin films (approximate to 250 nm thick) grown on silicon substrates using a linear antenna microwave plasma-enhanced chemical vapor deposition (CVD) system. Combining laser acoustic wave spectroscopy to determine the elastic properties with simple wafer curvature measurements, a straightforward method ...
Effect of Film Morphology on the Li Ion Intercalation Kinetics in Anodic Porous Manganese Dioxide Thin Films KU Leuven
Electrolytic manganese dioxide (EMD) films are electrodeposited from acid MnSO4 solution, targeting equivalent film thicknesses between 25 and 100 nm onto silicon substrates coated with Pt and TiN seed layers. The structure and morphology of the deposited EMD films are characterized and tied to the observed electrochemical performance. Deposition efficiencies as large as 80% are achieved, as determined from Rutherford back scattering (RBS). TEM ...
Atomic Layer Deposition of Ruthenium Thin Films from (Ethylbenzyl)(1-Ethyl-1,4-cyclohexadienyl) Ru: Process Characteristics, Surface Chemistry, and Film Properties Vrije Universiteit Brussel KU Leuven
The process characteristics, the surface chemistry, and the resulting film properties of Ru deposited by atomic layer deposition from (ethylbenzyl)(1-ethyl-1,4-cyclohexadienyl)Ru(0) (EBECHRu) and O2 are discussed. The surface chemistry was characterized by both combustion reactions as well as EBECHRu surface reactions by ligand release. The process behavior on TiN starting surfaces at 325 °C was strongly influenced by Ti(O,N)x segregation on the ...
Surface analysis of the selective excimer laser patterning of a thin PEDOT: PSS film on flexible polymer films Universiteit Gent
Tin sulfide thin films and Mo/p-SnS/n-CdS/ZnO heterojunctions for photovoltaic applications KU Leuven
Tin sulfide (SnS) is one of the most promising materials for photovoltaics. Here we report on the preparation as well as chemical, structural and physical characterization of the Mo/p-SnS/n-CdS/ZnO heterojunctions. The SnS thin films were grown by hot wall deposition method on the Mo-coated glass substrates at 270-350°C. The crystal structure and elemental composition were examined by X-ray diffraction and Auger electron spectroscopy methods. ...