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Infrastructure
Direct-write lithography system (LDI) (LDI)
The Heidelberg DWL66 LDI system uses laser direct imaging (LDI) to expose photosensitive materials with resolution down to 1 μm. Laser: 250mW @ 355nm.
Type: Equipment
Location type: Single sited
Accessibility: Everyone
User modalities: https://www.ugent.be/namifab/
In use: 1 Jan 2012 → Today
Disciplines: Semiconductor devices, nanoelectronics and technology
Keywords: maskless patterning, photoresist exposure, lithography, high resolution, laser direct imaging