Pulse Generator for Ultra-Dense Plasma Applications

This state-of-the-art pulse generator is specifically designed for High Power Impulse Magnetron Sputtering (HIPIMS). It significantly enhances plasma density and ionization by delivering high power pulses, transforming the plasma into a metal-based medium. This advanced capability allows precise control over thin film deposition, optimizing film growth and properties through negative substrate polarization. Ideal for research and development in thin film technologies, this pulse generator is essential for achieving superior material performance.