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Infrastructure
Reactive Ion Etcher (RIE) (RIE)
The Benchtop System VII is a reactive ion etcher (RIE) used for dry etching thin layers at room temperature. It is suitable for etching materials such as silicon dioxide, silicon nitride, and silicon oxynitride. Organic layers, such as polyimides, can also be roughened, thinned, or etched.
Type: Equipment
Location type: Single sited
Accessibility: Everyone
User modalities: https://www.ugent.be/namifab/
In use: 1 Jan 2000 → Today
Disciplines: Semiconductor devices, nanoelectronics and technology
Keywords: plasma etching, reactive ion etching, thin film patterning, dry etching, anisotropic etching, microfabrication