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Project
HaloFreeEtch: Novel approaches for halogen-free and sustainable etching of Silicon and Glass (EUAR196)
Current industrial plasma etching processes are not sustainable because they make use of halogens. HaloFreeEtch will take a fundamental,
interdisciplinary and systematic approach to find new halogen-free etching processes. HaloFreeEtch aims to identify new, halogen-free
and sustainable etching processes for sustainable semiconductor manufacturing, applied to deep etching of silicon and silicon oxide.
The novel etching processes we aim for shall be clean (in terms of harmful chemicals), efficient (in terms of processing speed and
manufacturability) and precise (in terms of the desired shapes). HaloFreeEtch will provide a novel model- and data-based methodology
for sustainability and life cycle analysis of plasma-etching to quantify the carbon-footprint of all novel etching processes. HaloFreeEtch
combines lab-scale research on three innovative technological routes with computational screening of novel and promising etchants,
a comprehensive multi-scale modeling approach to predict potential working points and a model-based life cycle and sustainability
analysis.
interdisciplinary and systematic approach to find new halogen-free etching processes. HaloFreeEtch aims to identify new, halogen-free
and sustainable etching processes for sustainable semiconductor manufacturing, applied to deep etching of silicon and silicon oxide.
The novel etching processes we aim for shall be clean (in terms of harmful chemicals), efficient (in terms of processing speed and
manufacturability) and precise (in terms of the desired shapes). HaloFreeEtch will provide a novel model- and data-based methodology
for sustainability and life cycle analysis of plasma-etching to quantify the carbon-footprint of all novel etching processes. HaloFreeEtch
combines lab-scale research on three innovative technological routes with computational screening of novel and promising etchants,
a comprehensive multi-scale modeling approach to predict potential working points and a model-based life cycle and sustainability
analysis.
Date:1 Sep 2024 → Today
Keywords:Halogen-free, Plasma, Etching, silicon
Disciplines:Other (bio)medical engineering not elsewhere classified
Project type:Collaboration project