< Back to previous pagePublication Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selector Journal Contribution - Journal ArticleJournal: Materials AdvancesIssue: 5Volume: 2Pages: 1635 - 1643Institutional Repository URL: https://lirias.kuleuven.be/3441131DOI: https://doi.org/10.1039/d0ma01014fWoS Id: 000629901500012 Accessibility:OpenSee also: Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selectorAuthors/publisherAli Haider (First author)Shaoren Deng (Author)Wouter Devulder (Author)Jan Willem Maes (Author)Jean-Marc Girard (Author)Gabriel Khalil El Hajjam (Author)Gouri Sankar Kar (Author)Karl Opsomer (Author)Christophe Detavernier (Author)Michael Givens (Author)Ludovic Goux (Author)Sven Van Elshocht (Author)Romain Delhougne (Author)Annelies Delabie (Author)Matty Caymax (Author)Johan Swerts (Last author)Research unitsQuantum Chemistry and Physical Chemistry(Division)KU Leuven
