Redox atomic layer deposition

Method to deposit a layer of inorganic material on a substrate surface, comprising one or more cycles, each cycle comprising the steps of:a) contacting the substrate surface with a first aqueous liquid solution comprising an organic compound having a functional group permitting its adsorption on the substrate, followed byb) contacting the substrate surface having the organic compound adsorbed thereon with a second liquid aqueous solution comprising an inorganic ion or an ion complex suitable for oxidizing the organic compound and having an insoluble reduction product which is the inorganic material.

Patent Publication Number: EP3575004

Year filing: 2018

Year approval: 2023

Year publication: 2023

Status: Assigned

Technology domains: Surface technology, coating

Validated for IOF-key: Yes

Attributed to: Associatie KULeuven