Formation of diamond membranes

In a first aspect, the present invention relates to a method for forming a diamond membrane (410), comprising:a. providing a substrate (100) having an amorphous dielectric layer (200) thereon, the amorphous dielectric layer (200) comprising an exposed surface (220), the exposed surface (220) having an isoelectric point of less than 7, preferably at most 6;b. seeding diamond nanoparticles (300) onto the exposed surface (220);c. growing a diamond layer (400) from the seeded diamond nanoparticles (300); andd. removing a portion (600) of the substrate (100) from underneath the diamond layer (400), the removed portion (600) extending at least up to the amorphous dielectric layer (200), thereby forming the diamond membrane (410) over the removed portion (600).

Patent Publication Number: EP3556454

Year filing: 2019

Year approval: 2020

Year publication: 2019

Status: Requested

Technology domains: Surface technology, coating, Chemical engineering

Validated for IOF-key: Yes

Attributed to: Association University - Colleges Limburg