Formation of diamond membranes

In a first aspect, the present disclosure relates to a method for forming a diamond membrane, comprising: providing a substrate having an amorphous dielectric layer thereon, the amorphous dielectric layer comprising an exposed surface, the exposed surface having an isoelectric point of less than 7, preferably at most 6; seeding diamond nanoparticles onto the exposed surface; growing a diamond layer from the seeded diamond nanoparticles; and removing a portion of the substrate from underneath the diamond layer, the removed portion extending at least up to the amorphous dielectric layer, thereby forming the diamond membrane over the removed portion.

Patent Publication Number: US20190314766

Source: USPTO

Year filing: 2019

Year publication: 2019

Status: Assigned

Technology domains: Chemical engineering, Semiconductors

Validated for IOF-key: Yes