Formation of diamond membranes

In a first aspect, the present disclosure relates to a method for forming a diamond membrane, comprising: providing a substrate having an amorphous dielectric layer thereon, the amorphous dielectric layer comprising an exposed surface, the exposed surface having an isoelectric point of less than 7, preferably at most 6; seeding diamond nanoparticles onto the exposed surface; growing a diamond layer from the seeded diamond nanoparticles; and removing a portion of the substrate from underneath the diamond layer, the removed portion extending at least up to the amorphous dielectric layer, thereby forming the diamond membrane over the removed portion.

Octrooi-publicatienummer: US20190314766

Bron: USPTO

Jaar aanvraag: 2019

Jaar van publicatie: 2019

Status: Toegewezen

Technologiedomeinen: Chemische ingenieurswetenschappen en techniek, Semiconductoren

Gevalideerd voor IOF-sleutel: Ja