An euvl scanner

The present invention relates to an EUVL scanner (10). The EUVL scanner comprises: an EUV light source (110); a reticle (120); a pellicle (130) mounted in front of the reticle (120) and comprising an EUV transmissive membrane (132) which, in use, scatters transmitted light into an elliptical scattering pattern (112) having a major axis (114); and an anamorphic high-NA imaging system (140) configured to project, onto a target wafer (150), light reflected by the reticle (120) through the pellicle (130); wherein a cross section (162) of an acceptance cone (160) of the imaging system (140) has a major axis (164), and wherein the pellicle (130) is arranged relative to the imaging system (140) such that the major axis (114) of the scattering pattern (112) is oriented at an angle relative to the major axis (164) of the cross section (162) of the acceptance cone (160) of the imaging system (140).

Patent Publication Number: EP3674797

Year filing: 2021

Year approval: 2021

Year publication: 2021

Status: Assigned

Technology domains: Optics, Materials, metallurgy

Validated for IOF-key: Yes

Attributed to: Associatie KULeuven