Aqueous solution-gel preparation of ultrathin ZrO2 films for gate dielectric application

Zirconia ultrathin films were deposited by aqueous chemical solution deposition, using citratoperoxo-Zr(IV) precursors with different citric acid content. The precursor synthesis, thermal decomposition and crystallization of oxide powders were studied. This showed an effect of the citric acid content in every stage. The precursors were applied for the deposition of uniform, ultrathin films (<30 nm thickness) as well. Tetragonal ZrO2 crystallized starting from 500 degrees C for thin films with a thickness of 10 nm. This was independent of the citric acid content in the precursor. The topography after annealing at 600 degrees C was also similar. However, annealing at higher temperatures led to coarser grain size. The dielectric constant was high (similar to 21-22) and comparable to ZrO2 deposited by atomic layer deposition. (C) 2008 Elsevier B.V. All rights reserved.

Jaar van publicatie:2008

Trefwoorden:ZrO2, Aqueous solution-gel route, Citric acid content, Ultrathin films, High-k

BOF-keylabel:ja

IOF-keylabel:ja

BOF-publication weight:1

CSS-citation score:2

Toegankelijkheid:Open