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Onderzoeker
Yannick Vesters
- Disciplines:Fysica van gecondenseerde materie en nanofysica, Analytische chemie, Anorganische chemie, Organische chemie, Fysische chemie, Farmaceutische analyse en kwaliteitszorg
Affiliaties
- Duurzame Chemie voor Metalen en Moleculen (Afdeling)
Lid
Vanaf16 mrt 2015 → 30 mei 2019
Projecten
1 - 1 of 1
- Licht-materie interacties in fotoresists voor extreem ultraviolet lithografieVanaf15 mrt 2015 → 3 apr 2019Financiering: Eigen Middelen zoals patrimonium, inschrijvingsgelden, giften, ....
Publicaties
1 - 10 van 13
- Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist(2018)
Auteurs: Yannick Vesters
Pagina's: 747 - 751 - Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement(2018)
Auteurs: Yannick Vesters, Stefan De Gendt
Pagina's: 043506-1 - 043506-8 - Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure(2018)
Auteurs: Ivan Polentier, Yannick Vesters, John S Petersen, Pieter Vanelderen, Ashish Rathore, Danilo De Simone, Geert Vandenberghe, CK Hohle
Aantal pagina's: 11 - EUV photoresist patterning characterization for imec N7/N5 technology(2018)
Auteurs: Yannick Vesters
Aantal pagina's: 15 - The Path to Better Understanding Stochastics in EUV Photoresist(2018)
Auteurs: Yannick Vesters
Pagina's: 651 - 655 - Multi-Trigger Resist Patterning with ASML NXE3300 EUV scanner(2018)
Auteurs: Yannick Vesters
Aantal pagina's: 10 - STATE-OF-THE-ART OF EUV MATERIALS FOR N5 LOGIC AND DRAM APPLICATIONS(2018)
Auteurs: Danilo De Simone, Yannick Vesters, Pieter Vanelderen, Xue Ran, Ivan Pollentier, Geert Vandenberghe, KG Ronse, E Hendrickx, PP Naulleau, PA Gargini, et al.
Aantal pagina's: 18 - Multi Trigger Resist for EUV Lithography(2018)
Auteurs: Yannick Vesters
Pagina's: 227 - 232 - Sensitizers in EUV Chemically Amplified Resist: Mechanism of sensitivity improvement(2018)
Auteurs: Yannick Vesters, Stefan De Gendt
Aantal pagina's: 11 - Dissolution rate Monitor Tool to Measure EUV Photoresist Dissolution(2017)
Auteurs: Yannick Vesters, Stefan De Gendt
Pagina's: 675 - 681