Onderzoeker
Andreas Werbrouck
- Trefwoorden:Lithium-ion batterijen, atomaire laagdepositie
- Disciplines:Oppervlakte engineering, Fysica van gecondenseerde materie en nanofysica, Oppervlakten, interfaces, 2D-materialen
Affiliaties
- Vakgroep Vastestofwetenschappen (Departement)
Lid
Vanaf22 aug 2016 → Heden
Projecten
1 - 1 of 1
- Atomaire laag depositie van inorganische elektrolieten voor lithiumion
batterijenVanaf1 jan 2017 → 31 dec 2020Financiering: FWO Strategische Onderzoeksbeurs
Publicaties
1 - 10 van 18
- Strategies to produce boron-containing ALD thin films using trimethyl borate precursor : from thermal to plasma to combined-plasma approach(2022)
Auteurs: Arpan Dhara, Andreas Werbrouck, Jin Li, Jolien Dendooven, Christophe Detavernier
Aantal pagina's: 1 - Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate(2022)
Auteurs: Andreas Werbrouck, Felix Mattelaer, Arpan Dhara, Mikko Nisula, Matthias Minjauw, Frans Munnik, Jolien Dendooven, Christophe Detavernier
Pagina's: 3543 - 3551 - Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxide(2022)
Auteurs: Nithin Poonkottil, Matthias Minjauw, Andreas Werbrouck, Stefano Checchia, Eduardo Solano, Mikko Nisula, Alexis Franquet, Christophe Detavernier, Jolien Dendooven
Pagina's: 8946 - 8958 - Selective vapor-phase doping of Pt nanoparticles into phase-controlled nanoalloys(2022)
Auteurs: Nithin Poonkottil, Ranjith Karuparambil Ramachandran, Eduardo Solano Minuesa, . Nadadur Veeraraghavan Srinath, Ji-Yu Feng, Andreas Werbrouck, Michiel Van Daele, Matthias Filez, Matthias Minjauw, Hilde Poelman, et al.
Pagina's: 1426 - 1438 - Atomic layer deposition of metal phosphates(2022)
Auteurs: Lowie Henderick, Arpan Dhara, Andreas Werbrouck, Jolien Dendooven, Christophe Detavernier
- Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants(2021)Volume: MA2021-02
Auteurs: Nithin Poonkottil, Matthias Minjauw, Andreas Werbrouck, Christophe Detavernier, Jolien Dendooven
Pagina's: 876 - 876 - Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth(2021)
Auteurs: Andreas Werbrouck, Kevin Van de Kerckhove, Diederik Depla, Dirk Poelman, Philippe Smet, Jolien Dendooven, Christophe Detavernier
- Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification(2021)
Auteurs: Juan Santo-Domingo Peñaranda, Mikko Nisula, Sofie Vandenbroucke, Matthias Minjauw, Jin Li, Andreas Werbrouck, Jonas Keukelier, Andrea Itziar Pitillas Martinez, Jolien Dendooven, Christophe Detavernier
Aantal pagina's: 1 - Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification(2021)
Auteurs: Juan Santo-Domingo Peñaranda, Mikko Nisula, Sofie Vandenbroucke, Matthias Minjauw, Jin Li, Andreas Werbrouck, Andrea Itziar Pitillas Martinez, Jolien Dendooven, Christophe Detavernier
Pagina's: 1224 - 1232 - A secondary reaction pathway for the alumina atomic layer deposition process with trimethylaluminum and water, revealed by full-range, time-resolved in situ mass spectrometry(2020)
Auteurs: Andreas Werbrouck, Mahdi Shirazi, Felix Mattelaer, Simon D. Elliott, Jolien Dendooven, Christophe Detavernier
Pagina's: 26443 - 26454