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Onderzoeker
Roeland Schelfhout
- Disciplines:Fysica van gecondenseerde materie en nanofysica
Affiliaties
- Vakgroep Vastestofwetenschappen (Departement)
Lid
Vanaf8 jul 2014 → 25 sep 2022
Publicaties
1 - 9 van 9
- Sputter yield measurements to evaluate the target state during reactive magnetron sputtering(2020)
Auteurs: Roeland Schelfhout, Koen Strijckmans, Diederik Depla
- Modeling reactive magnetron sputtering : opportunities and challenges(2019)
Auteurs: Diederik Depla, Koen Strijckmans, Dulmaa Altangerel, Florian Cougnon, Robin Dedoncker, Roeland Schelfhout, Isabella Schramm, Filip Moens, Roger De Gryse
- Tutorial: Hysteresis during the reactive magnetron sputtering process(2018)
Auteurs: Koen Strijckmans, Roeland Schelfhout, Diederik Depla
- Anomalous effects in the aluminum oxide sputtering yield(2018)
Auteurs: Roeland Schelfhout, Koen Strijckmans, Diederik Depla
- An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering(2018)
Auteurs: Roeland Schelfhout, Koen Strijckmans
Pagina's: 231 - 236 - The existence of a double S-shaped process curve during reactive magnetron sputtering(2016)
Auteurs: Roeland Schelfhout, Koen Strijckmans
- Hysteresis behavior during facing target magnetron sputtering(2016)
Auteurs: Florian Cougnon, Koen Strijckmans, Roeland Schelfhout
Pagina's: 215 - 219 - On the target surface cleanness during magnetron sputtering(2015)
Auteurs: Roeland Schelfhout, Koen Strijckmans, Francis Boydens
Pagina's: 743 - 747 - On the target surface cleanness during magnetron sputtering(2015)
Auteurs: Roeland Schelfhout
Aantal pagina's: 1